Please request access to reprints here. Hirsch indices (based on ISI Web of Science) all papers: h=56, m=2.3 (04/2013, 370 publ., 13221 cit. (11868 w/o self cit.), 5 most quoted: 920, 746, 600, 531, 396) Leipzig papers only: h=34, m=2.8 (04/2013, 230 publ., 4604 cit. (3791 w/o self cit.), 5 most quoted: 263, 258, 247, 151, 146) Hirsch indices (based on Google Scholar): all: 63, last 5 years: 43 Researcher-ID
 all journals AdvMat APL JAP JJAP PRA PRB PRL NT NL JEM SSE SSC SST SLMS TSF JCG NJP pss(a) pss(b) pss(c) pss(RRL) JVSTA JVSTB MRS SPIE all years 2013 2012 2011 2010 2009 2008 2007 2006 2005 2000-2004 1995-1999 1990-1994 1988-1989 all authors Grundmann Lorenz von Wenckstern Pickenhain Rheinländer Schmidt-Grund Bimberg Alferov Christen Krost all info no icons RTF Uni 14 M. Brandt, H. Frenzel, H. Hochmuth, M. Lorenz, M. Grundmann, J. Schubert Ferroelectric thin film field-effect transistors based on ZnO/BaTiO3 heterostructures
 J. Vac. Sci. Technol. B 27, 1789-1793 (2009) [ pdf | doi ] 13 C. Czekalla, C. Sturm, R. Schmidt-Grund, B. Cao, J. Zúñiga Pérez, M. Lorenz, M. Grundmann Optical characterization of zinc oxide microlasers and microwire core-shell heterostructures
 J. Vac. Sci. Technol. B 27, 1780-1783 (2009) [ pdf | doi ] 12 A. Lajn, H. von Wenckstern, Z. Zhang, C. Czekalla, G. Biehne, J. Lenzner, H. Hochmuth, M. Lorenz, M. Grundmann, S. Wickert, C. Vogt, R. Denecke Properties of reactively sputtered Ag, Au, Pd, and Pt Schottky contacts on n-type ZnO
 J. Vac. Sci. Technol. B 27, 1769-1773 (2009) [ pdf | doi ] 11 M. Lange, J. Zippel, G. Benndorf, H. Hochmuth, M. Lorenz, M. Grundmann Temperature Dependence of Localization Effects of Excitons in ZnO/CdxZn1-xO/ZnO Double Heterostructures
 J. Vac. Sci. Technol. B 27, 1741-1745 (2009) [ pdf | doi ] 10 J. Zippel, J. Lenzner, G. Benndorf, M. Lange, H. Hochmuth, M. Lorenz, M. Grundmann Electronic coupling in MgxZn1-xO/ZnO double quantum wells
 J. Vac. Sci. Technol. B 27, 1735-1740 (2009) [ pdf | doi ] 9 C. Sturm, H. Hilmer, R. Schmidt-Grund, C. Czekalla, J. Sellmann, J. Lenzner, M. Lorenz, M. Grundmann Strong Exciton-Photon Coupling In ZnO based Resonators
 J. Vac. Sci. Technol. B 27, 1726-1730 (2009) [ pdf | doi ] 8 M. Lorenz, B. Cao, G. Zimmermann, G. Biehne, C. Czekalla, H. Frenzel, M. Brandt, H. von Wenckstern, M. Grundmann Stable p-type ZnO:P nanowire/n-type ZnO:Ga film junctions, reproducibly grown by two-step pulsed laser deposition
 J. Vac. Sci. Technol. B 27, 1693-1697 (2009) [ pdf | doi ] 7 M. Brandt, H. von Wenckstern, Ch. Meinecke, T. Butz, H. Hochmuth, M. Lorenz, M. Grundmann Dopant activation in homoepitaxial MgZnO:P thin films
 J. Vac. Sci. Technol. B 27, 1604-1608 (2009) [ pdf | doi ] 6 M. Schmidt, M. Ellguth, C. Czekalla, H. von Wenckstern, R. Pickenhain, M. Grundmann, G. Brauer, W. Skorupa, M. Helm, Q. Gu, Ch.Ch. Ling Defects in zinc-implanted ZnO thin films
 J. Vac. Sci. Technol. B 27, 1597-1600 (2009) [ pdf | doi ] 5 X. Yang, L. J. Brillson, A. D. Raisanen, L. Vanzetti, A. Bonanni, A. Franciosi, M. Grundmann, D. Bimberg Evolution of deep levels and internal photoemission with annealing temperature at ZnSe/GaAs interfaces
 J. Vac. Sci. Technol. B 14, 2961-2966 (1996) [ pdf | doi ] 4 M. Grundmann, A. Krost, D. Bimberg, H. Cerva InGaAs/InP Quantum Wells on vicinal Si(001): Structural and Optical Properties
 J. Vac. Sci. Technol. B 10, 1840-1843 (1992) [ pdf | doi ] 3 J. Christen, M. Grundmann, D. Bimberg Scanning Cathodoluminescence Microscopy: A Unique Approach to Atomic Scale Characterization of HeteroInterfaces and Imaging of Semiconductor Inhomogeneities
 J. Vac. Sci. Technol. B 9, 2358-2368 (1991) [ pdf | doi ] 2 M. Grundmann, A. Krost, D. Bimberg Observation of the First Order Phase Transition from Single to Double Stepped Si (001) in Metalorganic Chemical Vapor Deposition of InP on Si
 J. Vac. Sci. Technol. B 9, 2158-2166 (1991) [ pdf | doi ] 1 M. Grundmann, U. Lienert, J. Christen, D. Bimberg, A. Fischer-Colbrie, J.N. Miller Dependence of Structural and Optical Properties of In0.23Ga0.77As/GaAs Quantum Wells on Misfit Dislocations: Different Critical Thickness for Dislocation Generation and Degradation of Optical Properties
 J. Vac. Sci. Technol. B 8, 751-757 (1990) [ pdf | doi ] |